Loeb & Loeb LLP is proud to sponsor and co-host the American Intellectual Property Law Association (AIPLA) CLE conference, "Ethics in Patent Prosecution."
From the program brochure:
Join AIPLA for a simultaneous in-person and a live video conference CLE originating from Washington with remote sites in Atlanta, Boston, Chicago, New York, and Seattle. Two of the country's leading experts on ethical issues in patent prosecution will discuss developing ethical issues under the AIA and perhaps where problems will arise in the future, the proposed new PTO rules of ethics, as well as new theories of liability concerning the misuse of information. Among other things, the AIA creates potential conflicts between lawyer and client, and clients have successfully maintained claims against lawyers who have taken text from their published patent applications and copied it into another client's case.